Dependence of composition distribution of NiTi sputtered films on Ar gas pressure Toshinari Yamazaki, Toshio Yoshizawa, Hisatoshi Takada, Fumio Takeda, Toshio Kikuta, Noriyuki Nakatani, Tatsuo Yamabuchi Jpn. J. Appl. Phys., 40(12), 6936-6940 (2001). Dec.